Mj-Level Titanium Sapphire Femtosecond Amplifier

Product Details
Customization: Available
After-sales Service: 1 Year
Divergence Angle: =0.5mrad

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  • Mj-Level Titanium Sapphire Femtosecond Amplifier
  • Mj-Level Titanium Sapphire Femtosecond Amplifier
  • Mj-Level Titanium Sapphire Femtosecond Amplifier
  • Mj-Level Titanium Sapphire Femtosecond Amplifier
  • Mj-Level Titanium Sapphire Femtosecond Amplifier
  • Mj-Level Titanium Sapphire Femtosecond Amplifier
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  • Overview
  • Detailed Photos
  • Product Parameters
  • Company Profile
Overview

Basic Info.

Model NO.
mJ-Level Titanium Sapphire Femtosecond Amplifier
Beam Pointing Stability
<10μrad (RMS)
Beam Quality
Tem00 (Dual-Axis, M²<1.3)
Transport Package
Wooden Box
Trademark
Resound
Origin
China

Product Description

Detailed Photos

Mj-Level Titanium Sapphire Femtosecond AmplifierMj-Level Titanium Sapphire Femtosecond AmplifierMj-Level Titanium Sapphire Femtosecond AmplifierMj-Level Titanium Sapphire Femtosecond AmplifierMj-Level Titanium Sapphire Femtosecond AmplifierMj-Level Titanium Sapphire Femtosecond Amplifier

Product Parameters


Product Introduction

The Lancer series lasers are among the most ultra-compact femtosecond titanium sapphire amplifiers available today. Through a single-stage regenerative amplification, they can output single pulse energies of up to 15 mJ, with selectable repetition rates from 1 to 1 kHz, and allow for pulse width adjustments ranging from 30 fs to 1 ps. The Lancer series employs a unique large mode area amplification technology combined with advanced dual-end pumping, enabling the laser to achieve high energy and excellent beam quality while maintaining good pointing stability and beam profile consistency. Additionally, thanks to the dual protection design of a sealed module and integrated casing, Lancer products maintain high reliability and stability even in non-laboratory environments.


Features

1. Industrial-grade reliability. 5. Selectable repetition rates from 1 to 1 kHz.
2. High integration mechanical design. 6. Synchronisation and phase locking functionality.
3. Pulse energy of up to 15 mJ. 7. Optional second and third harmonic generation modules.
4. Adjustable pulse width from 30 fs to 1 ps. 8. Customisable central wavelength and pulse width.


Parameters
Parameter Lancer-D10 Lancer-N10 Lancer-K3 Lancer-K7
Central Wavelength 780-820nm (nominal), optional second and third harmonic generation 780-820nm (nominal), optional second and third harmonic generation 780-820nm (nominal), optional second and third harmonic generation 780-820nm (nominal), optional second and third harmonic generation
Pulse Energy 7-15mJ selectable >3mJ >7mJ >7mJ
Maximum Repetition Rate 10Hz/100Hz/1kHz 10Hz/100Hz/1kHz 10Hz/100Hz/1kHz 10Hz/100Hz/1kHz
Pulse Width ≤35fs ≤35fs ≤35fs ≤35fs
Power Stability <1.0% (RMS) c0.59% (RMS) <1.0% (RMS) c0.59% (RMS)
Pre-Pulse and Post-Pulse Contrast >1000:1; >100:1 >1000:1; >100:1 >1000:1; >100:1 >1000:1; >100:1
Beam Quality TEM00 (dual-axis, M²<1.3) TEM00 (dual-axis, M²<1.3) TEM00 (dual-axis, M²<1.3) TEM00 (dual-axis, M²<1.3)
Beam Size (1/e²) 10mm (nominal) 6mm (nominal) 10mm (nominal) 10mm (nominal)
Beam Pointing Stability <10μrad (RMS) <10μrad (RMS) <10μrad (RMS) <10μrad (RMS)
Divergence Angle =0.5mrad =0.5mrad =0.5mrad =0.5mrad
Polarisation State Horizontal linear polarised Horizontal linear polarised Horizontal linear polarised Horizontal linear polarised
Synchronisation Locking Module Optional, jitter <150fs after locking Optional, jitter <150fs after locking Optional, jitter <150fs after locking Optional, jitter <150fs after locking



Additional Notes on Parameters

  1. All parameters apply to laser operation at a central wavelength of 800 nm. Due to continual product optimisation, changes to parameters may occur without prior notice.
  2. The central wavelength can be customised according to customer requirements.
  3. Lower energy models are available upon request.
  4. The maximum repetition rate can reach up to 10 kHz; please contact us for further details.
  5. When purchasing, please specify the minimum pulse width requirements.
  6. RMS values are measured after 8 hours of operation at full energy.
  7. Defined as the ratio of the output pulse peak intensity to the peak intensity of any pulse within a time range of 1 ns before or after.
  8. RMS values are measured after 8 hours of operation at full energy, under ambient temperature of 21°C ±0.5°C.
  9. Some models feature vertical linear polarisation; please contact us for further details.



Typical Applications

  1. Pumping OPA (Optical Parametric Amplifier)
  2. Ultrafast transient absorption spectroscopy
  3. Femtosecond laser-driven photocathodes
  4. Femtosecond pulse deposition
  5. Plasma femtosecond optical probing
  6. High-order harmonic generation
  7. Front-end for TW/PW large scientific facilities
Company Profile
Resound Photoelectric Technology Research Institute (LSRPTR)

Resound Photoelectric Technology Research Institute (LSRPTR), also known as Resound Research Institute, is affiliated with China Haiheng International Trade Group Co., Ltd. (CHHGC). As an investment attraction enterprise in Zhongyuan Science and Technology City and a construction unit of the Zhongyuan Aurora Laboratory, the institute is committed to the industrialization of scientific and technological achievements, guided by market demand.

 

Technical Cooperation

Resound Research Institute has established technical cooperation with numerous well-known domestic and foreign universities, research institutes, and enterprise platforms, including:
 
Tsinghua University
Lanzhou University
Zhengzhou University
Altai State Technical University of Russia
Northwestern Polytechnical University
Chinese Academy of Engineering
Henan Academy of Sciences
China Electronics Technology Group
CGN Group
Xiamen University
Henan University
National University
University of Electronic Science and Technology of China
Chinese Academy of Sciences
China Academy of Engineering Physics
China Shipbuilding Group
China Electronics Group
Henan Inspection Group
 

Research and Development Fields

* Applications of Micro-Electromechanical and Lithography Technology
* Optoelectronics and Spectroscopy Technology
* High-Power Laser and Device Preparation Technology
* Nuclear Instrument and Emergency Equipment System Applications

 

Introducing Advanced Technologies and Products

Resound Research Institute continuously introduces advanced new technologies and products in industrial application scenarios such as market supervision, public safety, environmental monitoring, and science, education, research, and production. This has led to the formation of a domestically produced high-end scientific equipment industry base that integrates design, research and
development, production, sales, and services. This base drives the iteration of downstream industry technology, enhances the transformation and industrialization level of scientific and technological achievements, and provides technological sources for innovative development.


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