Stepper Lithography Used Integrated Circuits, Semiconductors

• Customization: Available
• After-sales Service: 1 Year
• Chip Size: Four Inches, Six Inches, Eight Inches, T
• Model NO.: LSLM 500
• Exposure Light Source: UV-LED
• Light Source Wavelength Used: 365 Nm
• Resolving Power: 500 Nm, 400 Nm and 300 Nm Were Dev
• Focus Accuracy: 150 Nm
• Scale Multiplier: 1:5
• Exposure Mode: Step Projection
• Feature Size Uniformity(Cdu): ±10%
• Transport Package: Wooden Box
• Specification: 170 cm*130 cm*180 cm
• Trademark: Resound
• Origin: China

Product Description

Detailed Photos

 

Product Parameters

 

Product characteristics

·High precision;
·Desktop, small size, built-in computer,
·Customizable hardware and softwareto meet industry needs;
·Elasticity is suitable for various basesand shapes;


Product introduction

The LSLM-500 step lithography machine is a device used to make integrated circuits (ics),which can form millions of microscopic circuit components on the surface of tiny siliconwafers, an important part of a complex process.
Main Use: Step lithography can be used to reduce the scale of the mask pattern onto thesubstrate surface to be exposed. It can be widely used in the development and production ofsmall and medium-sized integrated circuits, semiconductor components and surfaceacoustic wave devices.
Main specifications: The mask pattern can be reduced by 5 times in the same proportion forexposure; Minimum line width: 500nm; Can cooperate with a variety of models of positiveand negative light resistance.
Sputtering materials: metals Al, Cu, Gr, Co, Fe, Ni, Pt, Ag, Ti, Ta; Alloy NiFe, CoFe, CoFeBNiMn, FeMn, TbFeco: Oxides Mgo, etc.
Applications: small and medium-sized integrated circuits; Semiconductor componentsDevelopment and production of surface acoustic wave devices;


Specification parameter

Project	Content
Chip size	Four inches, six inches, eight inches, twelve inches
Exposure light source	UV-LED
Light source wavelengthused	365 nm
Resolving power	500 nm,400 nm and 300 nm were developed successively
Focus accuracy	150 nm
Scale Multiplier	1:5
Exposure mode	Step projection
Feature size unifomity(CDU)	±10%
Dimensions	170 cm*130 cm*180 cm

Company Profile

Resound Photoelectric Technology Research Institute (LSRPTR)

Resound Photoelectric Technology Research Institute (LSRPTR), also known as Resound Research Institute, is affiliated with China Haiheng International Trade Group Co., Ltd. (CHHGC). As an investment attraction enterprise in Zhongyuan Science and Technology City and a construction unit of the Zhongyuan Aurora Laboratory, the institute is committed to the industrialization of scientific and technological achievements, guided by market demand.
 

Technical Cooperation

Resound Research Institute has established technical cooperation with numerous well-known domestic and foreign universities, research institutes, and enterprise platforms, including:

 

Tsinghua University
Lanzhou University
Zhengzhou University
Altai State Technical University of Russia
Northwestern Polytechnical University
Chinese Academy of Engineering
Henan Academy of Sciences
China Electronics Technology Group
CGN Group
Xiamen University
Henan University
National University
University of Electronic Science and Technology of China
Chinese Academy of Sciences
China Academy of Engineering Physics
China Shipbuilding Group
China Electronics Group
Henan Inspection Group

 

Research and Development Fields

* Applications of Micro-Electromechanical and Lithography Technology
* Optoelectronics and Spectroscopy Technology
* High-Power Laser and Device Preparation Technology
* Nuclear Instrument and Emergency Equipment System Applications
 

Introducing Advanced Technologies and Products

Resound Research Institute continuously introduces advanced new technologies and products in industrial application scenarios such as market supervision, public safety, environmental monitoring, and science, education, research, and production. This has led to the formation of a domestically produced high-end scientific equipment industry base that integrates design, research and
development, production, sales, and services. This base drives the iteration of downstream industry technology, enhances the transformation and industrialization level of scientific and technological achievements, and provides technological sources for innovative development.