Lslm-500 Stepper Lithography Used Integrated Circuits, Semiconductors

Product Details
Customization: Available
After-sales Service: 1 Year
Chip Size: Four Inches, Six Inches, Eight Inches, T

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  • Overview
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  • Product Parameters
  • Company Profile
Overview

Basic Info.

Exposure Light Source
UV-LED
Light Source Wavelength Used
365 Nm
Resolving Power
500 Nm, 400 Nm and 300 Nm Were Dev
Focus Accuracy
150 Nm
Scale Multiplier
1:5
Exposure Mode
Step Projection
Feature Size Uniformity(Cdu)
±10%
Transport Package
Wooden Box
Specification
170 cm*130 cm*180 cm
Trademark
Resound
Origin
China

Product Description

Detailed Photos

 

Lslm-500 Stepper Lithography Used Integrated Circuits, SemiconductorsLslm-500 Stepper Lithography Used Integrated Circuits, Semiconductors
Product Parameters

 

Product characteristics

·High precision;
·Desktop, small size, built-in computer,
·Customizable hardware and softwareto meet industry needs;
·Elasticity is suitable for various basesand shapes;


Product introduction

The LSLM-500 step lithography machine is a device used to make integrated circuits (ics),which can form millions of microscopic circuit components on the surface of tiny siliconwafers, an important part of a complex process.
Main Use: Step lithography can be used to reduce the scale of the mask pattern onto thesubstrate surface to be exposed. It can be widely used in the development and production ofsmall and medium-sized integrated circuits, semiconductor components and surfaceacoustic wave devices.
Main specifications: The mask pattern can be reduced by 5 times in the same proportion forexposure; Minimum line width: 500nm; Can cooperate with a variety of models of positiveand negative light resistance.
Sputtering materials: metals Al, Cu, Gr, Co, Fe, Ni, Pt, Ag, Ti, Ta; Alloy NiFe, CoFe, CoFeBNiMn, FeMn, TbFeco: Oxides Mgo, etc.
Applications: small and medium-sized integrated circuits; Semiconductor componentsDevelopment and production of surface acoustic wave devices;


Specification parameter
Project Content
Chip size Four inches, six inches, eight inches, twelve inches
Exposure light source UV-LED
Light source wavelengthused 365 nm
Resolving power 500 nm,400 nm and 300 nm were developed successively
Focus accuracy 150 nm
Scale Multiplier 1:5
Exposure mode Step projection
Feature size unifomity(CDU) ±10%
Dimensions 170 cm*130 cm*180 cm
Company Profile
Resound Photoelectric Technology Research Institute (LSRPTR)

Resound Photoelectric Technology Research Institute (LSRPTR), also known as Resound Research Institute, is affiliated with China Haiheng International Trade Group Co., Ltd. (CHHGC). As an investment attraction enterprise in Zhongyuan Science and Technology City and a construction unit of the Zhongyuan Aurora Laboratory, the institute is committed to the industrialization of scientific and technological achievements, guided by market demand.

 

Technical Cooperation

Resound Research Institute has established technical cooperation with numerous well-known domestic and foreign universities, research institutes, and enterprise platforms, including:
 
Tsinghua University
Lanzhou University
Zhengzhou University
Altai State Technical University of Russia
Northwestern Polytechnical University
Chinese Academy of Engineering
Henan Academy of Sciences
China Electronics Technology Group
CGN Group
Xiamen University
Henan University
National University
University of Electronic Science and Technology of China
Chinese Academy of Sciences
China Academy of Engineering Physics
China Shipbuilding Group
China Electronics Group
Henan Inspection Group
 

Research and Development Fields

* Applications of Micro-Electromechanical and Lithography Technology
* Optoelectronics and Spectroscopy Technology
* High-Power Laser and Device Preparation Technology
* Nuclear Instrument and Emergency Equipment System Applications

 

Introducing Advanced Technologies and Products

Resound Research Institute continuously introduces advanced new technologies and products in industrial application scenarios such as market supervision, public safety, environmental monitoring, and science, education, research, and production. This has led to the formation of a domestically produced high-end scientific equipment industry base that integrates design, research and
development, production, sales, and services. This base drives the iteration of downstream industry technology, enhances the transformation and industrialization level of scientific and technological achievements, and provides technological sources for innovative development.


Lslm-500 Stepper Lithography Used Integrated Circuits, SemiconductorsLslm-500 Stepper Lithography Used Integrated Circuits, SemiconductorsLslm-500 Stepper Lithography Used Integrated Circuits, SemiconductorsLslm-500 Stepper Lithography Used Integrated Circuits, SemiconductorsLslm-500 Stepper Lithography Used Integrated Circuits, SemiconductorsLslm-500 Stepper Lithography Used Integrated Circuits, SemiconductorsLslm-500 Stepper Lithography Used Integrated Circuits, SemiconductorsLslm-500 Stepper Lithography Used Integrated Circuits, Semiconductors

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