Surface Acoustic Wave Device Production Step Lithography Machine

• Customization: Available
• After-sales Service: Factory Supply Service
• Warranty: 1 Years
• Model NO.: LSLM-500
• Wafer Size: 4 Inches, 6 Inches, 8 Inches,12 Inches
• Exposure Light Source: UV-LED
• Resolution: 0.5μm,0.4μm,0.3μm(Developed in Sequence)
• Alignment Accuracy: 0.15μm
• Scaling Ratio: 1:5
• Exposure Method: Step-and-Scan Projection
• Transport Package: Wooden Box
• Trademark: Resound
• Origin: China
• HS Code: 9031809090

Product Description

Product characteristics    
  High  precision;
   Desktop,small   size,built-in computer
 Customizable   hardware  and  software to meet industry needs;  
Elasticity  is  suitable  for various  bases and shapes;

Product introduction
The LSLM-500 step lithography machine is a device used to make integrated circuits (ics), which  can  form  millions  of  microscopic  circuit  components  on  the  surface  of  tiny  silicon
wafers,an important part of a complex process.
Main  Use:Step  lithography can  be  used to  reduce the scale of the  mask  pattern onto the substrate surface to be exposed.It can be widely used in the development and production of small   and    medium-sized    integrated    circuits,semiconductor   components    and    surface
caoin(u)ss(t)ipec(c w)aifivca(e)tdio(e)n(v)s(i):(c)e(.) mask pattern can be reduced by 5 times in the same proportion for
exposure;Minimum  line  width:500nm;Can  cooperate  with  a  variety  of  models  of  positive and negative light resistance.
Sputtering       materials:metals       Al,Cu,Gr,Co,Fe,Ni,Pt,Ag,Ti,Ta;Alloy       NiFe,CoFe,CoFeB,
NiMn,FeMn,TbFeCo;Oxides     MgO,etc.
Applications:small    and    medium-sized     integrated    circuits;Semiconductor     components; Development and production of surface acoustic wave devices;
Specification   parameter

 

Project	content
Chip size	Four inches,six inches,eight inches,twelve inches
Exposure light source	UV-LED
Light source wavelength used	365 nm
Resolving power	500 nm,400 nm and 300 nm were developed successively
Focus accuracy	150 nm
Scale Multiplier	1:5
Exposure mode	Step projection
Feature size uniformity (CDU)	±10%
Dimensions	170 cm*130 cm*180 cm