Contact Exposure Machine

• Specification: 170cm*130cm*180cm
• Trademark: CRT
• Origin: China
• Model NO.: LSCE-800

Product Description

Product characteristics    
·The  resolution  is  quite  accurate;
 A wider range of UV wavelengthselection;
 Support  constant  light  intensity  or  constant power  mode;
 Widely  used  in semiconductor,
microelectronics,biological  devices  and nanotechnology  fields;

Product introduction   
LSCE-800 contact exposure machine refers to that the mask plate directly contacts with the photoresist layer of the substrate,and the exposed figure has high resolution accuracy with the figure on the mask plate.The equipment is simple,and the line width can reach 800nm;A variety of models of positive and negative photoresist can be used together;It is suitable for ultraviolet or deep ultraviolet light exposure of materials ranging from special size substrates to very wide range of 4 sizes.It can be widely used in semiconductor manufacturing,optoelectronic,flat plate,RF microwave,diffractive optics,MEMS,concave convex or crystal coating equipment and other applications.
 Application field   
Semiconductor manufacturing;Optoelectronic,flat panel;Radio frequency microwave,diffraction optics; Mems;Concave-convex or coated crystal equipment.

Specification parameter    
 

Project	content
Chip size	Four inches,six inches,eight inches
Exposure light source	365nm,380nm,395nm Three wavelength LED integrated ight source
Resolving power	3μm
Alignment accuracy	300 nm
Scale Multiplier	1:5
Exposure mode	Contact exposure
Feature size uniformity	±10%
Size	170 cm*130 cm*180 cm